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arXiv:1210.5535 [pdf, ps, other]
Self-aligned graphene field-effect transistors with polyethyleneimine doped source/drain access regions
Abstract: We report a method of fabricating self-aligned, top-gated graphene field-effect transistors (GFETs) employing polyethyleneimine spin-on-doped source/drain access regions, resulting in a 2X reduction of access resistance and a 2.5X improvement in device electrical characteristics, over undoped devices. The GFETs on Si/SiO$_2$ substrates have high carrier mobilities of up to 6,300 cm$^2$/Vs. Self-al… ▽ More
Submitted 6 November, 2012; v1 submitted 19 October, 2012; originally announced October 2012.
Comments: 5 pages, 5 figures
Journal ref: Appl. Phys. Lett. 101, 183113 (2012)