Lithography-Free, Manganese-Based Ultra-Broadband Absorption Through Annealing-Based Deformation of Thin Layers into metal-air composites
Authors:
Majid Aalizadeh,
Amin Khavasi,
Bayram Butun,
Ekmel Ozbay
Abstract:
Fabrication, characterization, and analysis of an ultra-broadband lithography-free absorber is presented. An over 94% average absorption is experimentally achieved in the wavelength range of 450-1400 nm. This ultra-broadband absorption is obtained by a simple annealed tri-layer metal-insulator-metal (MIM) configuration. The metal used in the structure is Manganese (Mn), which also makes the struct…
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Fabrication, characterization, and analysis of an ultra-broadband lithography-free absorber is presented. An over 94% average absorption is experimentally achieved in the wavelength range of 450-1400 nm. This ultra-broadband absorption is obtained by a simple annealed tri-layer metal-insulator-metal (MIM) configuration. The metal used in the structure is Manganese (Mn), which also makes the structure cost-effective. It is shown that the structure retains its high absorption for TM polarization, up to 70 degrees, and, for TE polarization, up to 50 degrees. Moreover, the physical mechanism behind this broadband absorption is explained. Being both lithography-free and cost-effective, the structure is a perfect candidate for large-area and mass production purposes.
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Submitted 21 December, 2018; v1 submitted 16 October, 2018;
originally announced October 2018.
