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Showing 1–5 of 5 results for author: Buragohain, P

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  1. arXiv:2405.11122  [pdf

    cond-mat.mtrl-sci cond-mat.mes-hall

    Imaging Local Effects of Voltage and Boron Do** on Spin Reversal in Antiferromagnetic Magnetoelectric Cr2O3 Thin Films and Devices

    Authors: Adam Erickson, Syed Qamar Abbas Shah, Ather Mahmood, Pratyush Buragohain, Ilja Fescenko, Alexei Gruverman, Christian Binek, Abdelghani Laraoui

    Abstract: Chromia (Cr2O3) is a magnetoelectric oxide which permits voltage-control of the antiferromagnetic (AFM) order, but it suffers technological constraints due to its low Neel Temperature (TN ~307 K) and the need of a symmetry breaking applied magnetic field to achieve reversal of the Neel vector. Recently, boron (B) do** of Cr2O3 films led to an increase TN > 400 K and allowed the realization of vo… ▽ More

    Submitted 17 May, 2024; originally announced May 2024.

  2. arXiv:2309.14639  [pdf

    cond-mat.mtrl-sci

    Duality of switching mechanisms and transient negative capacitance in improper ferroelectrics

    Authors: Xin Li, Yu Yun, Pratyush Buragohain, Arashdeep Singh Thind, Donald A. Walko, Detian Yang, Rohan Mishra, Alexei Gruverman, Xiaoshan Xu

    Abstract: The recent discovery of transient negative capacitance has sparked an intense debate on the role of homogeneous and inhomogeneous mechanisms in polarizations switching. In this work, we report observation of transient negative capacitance in improper ferroelectric h-YbFeO3 films in a resistor-capacitor circuit, and a concaved shape of anomaly in the voltage wave form, in the early and late stage o… ▽ More

    Submitted 25 September, 2023; originally announced September 2023.

    Comments: 14 pages,5 figures

  3. arXiv:2109.05071  [pdf

    cond-mat.mtrl-sci

    Intrinsic ferroelectricity in Y-doped HfO2 thin films

    Authors: Yu Yun, Pratyush Buragohain, Ming Li, Zahra Ahmadi, Yizhi Zhang, Xin Li, Haohan Wang, Lingling Tao, Haiyan Wang, Jeffrey E. Shield, Evgeny Y. Tsymbal, Alexei Gruverman, Xiaoshan Xu

    Abstract: Ferroelectric HfO2-based materials hold great potential for widespread integration of ferroelectricity into modern electronics due to their robust ferroelectric properties at the nanoscale and compatibility with the existing Si technology. Earlier work indicated that the nanometer crystal grain size was crucial for stabilization of the ferroelectric phase of hafnia. This constraint caused high den… ▽ More

    Submitted 10 September, 2021; originally announced September 2021.

    Journal ref: Nature Materials 21, 903 (2022)

  4. Piezoelectricity in hafnia

    Authors: Sangita Dutta, Pratyush Buragohain, Sebastjan Glinsek, Claudia Richter, Hugo Aramberri, Haidong Lu, Uwe Schroeder, Emmanuel Defay, Alexei Gruverman, Jorge Íñiguez

    Abstract: Because of its compatibility with semiconductor-based technologies, hafnia (HfO$_{2}$) is today's most promising ferroelectric material for applications in electronics. Yet, knowledge on the ferroic and electromechanical response properties of this all-important compound is still lacking. Interestingly, HfO$_2$ has recently been predicted to display a negative longitudinal piezoelectric effect, wh… ▽ More

    Submitted 15 July, 2021; originally announced July 2021.

    Comments: 11 pages, 9 figures

  5. arXiv:2105.02628  [pdf

    cond-mat.mtrl-sci

    Persistent Ionic Photo-responses and Frank-Condon Mechanism in Proton-transfer Ferroelectrics

    Authors: Xuanyuan Jiang, Xiao Wang, Pratyush Buragohain, Andy Clark, Haidong Lu, Shashi Poddar, Le Yu, Anthony D DiChiara, Alexei Gruverman, Xuemei Cheng, Xiaoshan Xu

    Abstract: Photoexcitation is well-known to trigger electronic metastable states and lead to phenomena like long-lived photoluminescence and photoconductivity. In contrast, persistent photo-response due to ionic metastable states is rare. In this work, we report persistent structural and ferroelectric photo-responses due to proton metastable states via a nuclear quantum mechanism in ferroelectric croconic ac… ▽ More

    Submitted 6 May, 2021; originally announced May 2021.