Room temperature two terminal tunnel magnetoresistance in lateral graphene transistor
Authors:
C. I. L. de Araujo,
H. A. Teixeira,
O. O. Toro,
C. Liao,
J. Borme,
L. C. Benetti,
D. Schafer,
I. S. Brandt,
R. Ferreira,
P. Alpuim,
P. P. Freitas,
A. A. Pasa
Abstract:
We investigate the behavior of both pure spin and spin-polarized currents measured with four probe non-local and two probe local configurations up to room temperature and under external gate voltage in a lateral graphene transistor, produced using a standard large-scale microfabrication process. The high spin diffusion length of pristine graphene in the channel, measured both directly and by the H…
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We investigate the behavior of both pure spin and spin-polarized currents measured with four probe non-local and two probe local configurations up to room temperature and under external gate voltage in a lateral graphene transistor, produced using a standard large-scale microfabrication process. The high spin diffusion length of pristine graphene in the channel, measured both directly and by the Hanle effect, and the tuning of relation between electrode resistance area present in the device architecture, allowed us to observe local tunnel magnetoresistance at room temperature, a new finding for this type of device. Results also indicate that while pure spin currents are less sensitive to temperature variations, spin-polarized current switching by external voltage is more efficient, due to a combination of the Rashba effect and change in carrier mobility by Fermi level shift
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Submitted 20 November, 2021;
originally announced November 2021.
Substrate effects and diffusion dominated roughening in Cu2O electrodeposition
Authors:
I. S. Brandt,
V. C. Zoldan,
V. Stenger,
C. C. Pla Cid,
A. A. Pasa,
T. J. Oliveira,
F. D. A. Aarao Reis
Abstract:
Cuprous oxide (Cu2O) films from 25 nm to 1500 nm were electrodeposited on n-Si(100) and Ni/n-Si(100) substrates from aqueous solution at room temperature. X-ray diffraction and transmission electron microscopy imaging show that the Cu2O structure and morphology is strongly affected by the substrate choice, with V shape and U shape columnar growth on n-Si(100) and Ni/n-Si(100), respectively. Atomic…
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Cuprous oxide (Cu2O) films from 25 nm to 1500 nm were electrodeposited on n-Si(100) and Ni/n-Si(100) substrates from aqueous solution at room temperature. X-ray diffraction and transmission electron microscopy imaging show that the Cu2O structure and morphology is strongly affected by the substrate choice, with V shape and U shape columnar growth on n-Si(100) and Ni/n-Si(100), respectively. Atomic force microscopy reveals the presence of rounded grains at the surface in both cases. Anomalous and normal roughening are observed in films grown on n-Si and Ni, respectively, but estimates of scaling exponents are not conclusive. On the other hand, the distributions of local heights, roughness, and extremal heights show good agreement with those of the fourth order linear stochastic equation of Mullins and Herring (MH). Thus, surface dynamics in both systems is dominated by diffusion of adsorbed molecules, with no large scale effect of possible inhomogeneities in mass flux from the solution or in reaction and adsorption rates. In growth on n-Si substrates, the noise amplitude of the MH equation increases in time as t^{0.8}, while the coefficient of the curvature-related term is time-independent. Step edge energy barriers restrict the mass flux across grain boundaries, thus a broad size distribution of initial grains leads to coarsening of the larger ones. This explains their V shape in the thickest films and establishes a connection with the anomalous roughening. These effects are reduced in films grown on Ni/n-Si, which initially have much larger grains with narrower size distributions and, consequently, smaller fluctuations in coarse grained growth rates.
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Submitted 15 September, 2015;
originally announced September 2015.
