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High-field magnetoresistance of microcrystalline and nanocrystalline Ni metal at 3 K and 300 K
Authors:
I. Bakonyi,
F. D. Czeschka,
L. F. Kiss,
V. A. Isnaini,
A. T. Krupp,
K. Palotás,
S. Zsurzsa,
L. Péter
Abstract:
The magnetoresistance (MR) and the magnetization isotherms were studied up to high magnetic fields at T = 3 K and 300 K for a microcrystalline ($μ$c) Ni foil corresponding to bulk Ni and for a nanocrystalline (nc) Ni foil. At T = 3 K, for the $μ$c-Ni sample with a residual resistivity ratio (RRR) of 331, the field dependence of the resistivity was similar to what was reported previously for high-p…
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The magnetoresistance (MR) and the magnetization isotherms were studied up to high magnetic fields at T = 3 K and 300 K for a microcrystalline ($μ$c) Ni foil corresponding to bulk Ni and for a nanocrystalline (nc) Ni foil. At T = 3 K, for the $μ$c-Ni sample with a residual resistivity ratio (RRR) of 331, the field dependence of the resistivity was similar to what was reported previously for high-purity ferromagnets whereas the MR(H) behavior for the nc-Ni sample with RRR = 9 resembled that what was observed at low temperatures for Ni-based alloys with low impurity concentration. In the magnetically saturated state, the resistivity increased with magnetic field for both samples at T = 3 K and the field dependence was dominated by the ordinary MR due to the Lorentz force acting on the electron trajectories. However, the MR(H) curves were found to be saturating for $μ$c-Ni and non-saturating for nc-Ni, the difference arising from their very different electron mean free paths. At T = 300 K, the MR(H) curves of both Ni samples were very similar to those known for bulk Ni. After magnetic saturation, the resistivity decreased nearly linearly with magnetic field which behavior is due to the suppression of thermally-induced magnetic disorder with increasing magnetic field. The MR(H) data were analyzed at both temperatures with the help of Kohler plots from which the resistivity anisotropy splitting ($Δρ_{AMR}$) and the anisotropic magnetoresistance (AMR) ratio were derived. It was demonstrated that at T = 300 K, $ρ(H\rightarrow 0)=ρ(B\rightarrow 0)$ due to the negligible contribution of the ordinary MR. The data for the two Ni samples at 3 K and 300 K were found to indicate an approximately linear scaling of $Δρ_{AMR}$ with the zero-field resistivity. This implies that the AMR ratio does not vary significantly with temperature in either microstructural state of Ni.
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Submitted 22 March, 2022;
originally announced March 2022.
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Structure and Giant Magnetoresistance of Electrodeposited Co/Cu Multilayers Prepared by Two-Pulse (G/P) and Three-Pulse (G/P/G) Plating
Authors:
N. Rajasekaran,
L. Pogány,
Á. Révész,
B. G. Tóth,
S. Mohan,
L. Péter,
I. Bakonyi
Abstract:
The giant magnetoresistance (GMR) was investigated for electrodeposited Co/Cu multilayers. In order to better understand the formation of individual layers and their influence on GMR, multilayers produced by two different deposition strategies were compared. One series of Co(2 nm)/Cu(tCu) multilayers with tCu ranging from 0.5 nm to 6 nm was produced with the conventional two-pulse plating by using…
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The giant magnetoresistance (GMR) was investigated for electrodeposited Co/Cu multilayers. In order to better understand the formation of individual layers and their influence on GMR, multilayers produced by two different deposition strategies were compared. One series of Co(2 nm)/Cu(tCu) multilayers with tCu ranging from 0.5 nm to 6 nm was produced with the conventional two-pulse plating by using a galvanostatic/potentiostatic (G/P) pulse combination for the magnetic/non-magnetic layer deposition, respectively, whereby the Cu layer deposition was carried out at the electrochemically optimized potential. Another Co(2 nm)/Cu(tCu) multilayer series with the same tCu range was prepared with the help of a G/P/G pulse combination. In this latter case, first a bilayer of Co(2 nm)/Cu(6 nm) was deposited in each cycle as in the G/P mode after which a third G pulse was applied with a small anodic current to dissolve part of the 6 nm thick Cu layer in order to ensure the targeted tCu value. The comparison of the two series revealed that the G/P/G pulse combination yields multilayers for which GMR can be obtained even at such low nominal Cu layer thicknesses where G/P multilayers already exhibit bulk-like anisotropic magnetoresistance only. Surface roughness measurements by atomic force microscopy revealed that the two kinds of pulse combination yield different surface roughness values which correlate with the structural quality of the multilayers as indicated by the absence or presence of multilayer satellite reflections in the X-ray diffraction patterns. The results of multilayer chemical analysis revealed that mainly an increased Cu content of the magnetic layer is responsible for the onset of SPM regions in the form of Co segregations in the G/P/G multilayers with small Cu layer thicknesses.
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Submitted 17 April, 2017;
originally announced April 2017.
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Electrodeposition of Ni from Various Non-Aqueous Media: The Case of Alcoholic Solutions
Authors:
K. Neuróhr,
L. Pogány,
B. G. Tóth,
Á. Révész,
I. Bakonyi,
L. Péter
Abstract:
Although electrodeposition from aqueous media has been widely used to obtain metallic deposits, there are cases where the application of non-aqueous solutions offers advantages over the traditional baths or even represents the only way to electrodeposit some metals. For this reason, a study of the electrodeposition of Ni from various alcoholic solutions was performed. Apart from a detailed cyclic…
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Although electrodeposition from aqueous media has been widely used to obtain metallic deposits, there are cases where the application of non-aqueous solutions offers advantages over the traditional baths or even represents the only way to electrodeposit some metals. For this reason, a study of the electrodeposition of Ni from various alcoholic solutions was performed. Apart from a detailed cyclic voltammetry study of these solutions, the surface morphology, crystal structure and texture as well magnetic properties of the deposits have also been investigated. The best results were obtained with methanol as solvent, so results on Ni deposits prepared from this solution will be presented in more detail whereas the case of the other alcoholic solutions investigated will be summarized only briefly. Structural and magnetic properties of the deposits obtained have been compared to literature data on Ni samples obtained from various non-aqueous solvents.
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Submitted 4 April, 2017;
originally announced April 2017.
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Characterization of Defect Structure in Electrodeposited Nanocrystalline Ni Films
Authors:
Tamás Kolonits,
Péter Jenei,
Bence G. Tóth,
Zsolt Czigány,
Jenő Gubicza,
László Péter,
Imre Bakonyi
Abstract:
The microstructure of electrodeposited Ni films produced without and with organic additives (saccharin and formic acid) was investigated by X-ray diffraction (XRD) line profile analysis and cross-sectional transmission electron microscopy (TEM). Whereas the general effect of these additives on the microstructure (elimination of columnar growth as well as grain refinement) was reproduced, the prono…
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The microstructure of electrodeposited Ni films produced without and with organic additives (saccharin and formic acid) was investigated by X-ray diffraction (XRD) line profile analysis and cross-sectional transmission electron microscopy (TEM). Whereas the general effect of these additives on the microstructure (elimination of columnar growth as well as grain refinement) was reproduced, the pronounced intention of this study was to compare the results of various seldom-used high-performance structural characterization methods on identical electrodeposited specimens in order to reveal fine details of structural changes qualitatively not very common in this field. In the film deposited without additives, a columnar structure was observed showing similarities to the T-zone of structure zone models. Both formic acid and saccharin additives resulted in equiaxed grains with reduced size, as well as increased dislocation and twin fault densities in the nanocrystalline films. Moreover, the structure became homogeneous and free of texture within the total film thickness due to the additives. Saccharin yielded smaller grain size and larger defect density than formic acid. A detailed analysis of the grain size and twin boundary spacing distributions was carried out with the complementary application of TEM and XRD, by carefully distinguishing between the TEM and XRD grain sizes.
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Submitted 15 March, 2017;
originally announced March 2017.
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Giant magnetoresistance and structure of electrodeposited Co/Cu multilayers: the influence of layer thicknesses and Cu deposition potential
Authors:
N. Rajasekaran,
J. Mani,
B. G. Tóth,
G. Molnár,
S. Mohan,
L. Péter,
I. Bakonyi
Abstract:
The giant magnetoresistance (GMR) and structure was investigated for electrodeposited Co/Cu multilayers prepared by a conventional galvanostatic/potentiostatic pulse combination from a pure sulfate electrolyte with various layer thicknesses, total multilayer thickness and Cu deposition potential. X-ray diffraction (XRD) measurements revealed superlattice satellite reflections for many of the multi…
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The giant magnetoresistance (GMR) and structure was investigated for electrodeposited Co/Cu multilayers prepared by a conventional galvanostatic/potentiostatic pulse combination from a pure sulfate electrolyte with various layer thicknesses, total multilayer thickness and Cu deposition potential. X-ray diffraction (XRD) measurements revealed superlattice satellite reflections for many of the multilayers having sufficiently large thickness (at least 2 nm) of both constituent layers. The bilayer repeats derived from the positions of the visible superlattice reflections were typically 10-20% higher than the nominal values.The observed GMR was found to be dominated by the multilayer-like ferromagnetic (FM) contribution even for multilayers without visible superlattice satellites. There was always also a modest superparamagnetic (SPM) contribution to the GMR and this term was the largest for multilayers with very thin (0.5 nm) magnetic layers containg apparently a small amount of magnetically decoupled SPM regions. No oscillatory GMR behavior with spacer thickness was observed at any magnetic layer thickness. The saturation of the coercivity as measured by the peak position of the MR(H) curves indicated a complete decoupling of magnetic layers for large spacer thicknesses. The GMR increased with total multilayer thickness which could be ascribed to an increasing SPM contribution to the GMR due to an increasing surface roughness, also indicated by the increasing coercivity. For multilayers with Cu layers deposited at more and more positive potentials, the GMRFM term increased and the GMRSPM term decreased. At the same time, a corresponding reduction of surface roughness measured with atomic force microscopy indicated an improvement of the multilayer structural quality which was, however, not accompanied by an increase of the superlattice reflection intensities.
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Submitted 3 February, 2017;
originally announced February 2017.
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Thermoelectric power factor enhancement by spin-polarized currents - a nanowire case study
Authors:
Anna Corinna Niemann,
Tim Böhnert,
Ann-Kathrin Michel,
Svenja Bäßler,
Bernd Gotsmann,
Katalin Neuróhr,
Bence Tóth,
László Péter,
Imre Bakonyi,
Victor Vega,
Victor M. Prida,
Johannes Gooth,
Kornelius Nielsch
Abstract:
Thermoelectric (TE) measurements have been performed on the workhorses of today's data storage devices, exhibiting either the giant or the anisotropic magnetoresistance effect (GMR and AMR). The temperature-dependent (50-300 K) and magnetic field-dependent (up to 1 T) TE power factor (PF) has been determined for several Co-Ni alloy nanowires with varying Co:Ni ratios as well as for Co-Ni/Cu multil…
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Thermoelectric (TE) measurements have been performed on the workhorses of today's data storage devices, exhibiting either the giant or the anisotropic magnetoresistance effect (GMR and AMR). The temperature-dependent (50-300 K) and magnetic field-dependent (up to 1 T) TE power factor (PF) has been determined for several Co-Ni alloy nanowires with varying Co:Ni ratios as well as for Co-Ni/Cu multilayered nanowires with various Cu layer thicknesses, which were all synthesized via a template-assisted electrodeposition process. A systematic investigation of the resistivity, as well as the Seebeck coefficient, is performed for Co-Ni alloy nanowires and Co-Ni/Cu multilayered nanowires. At room temperature, measured values of TE PFs up to 3.6 mWK-2m-1 for AMR samples and 2.0 mWK-2m-1 for GMR nanowires are obtained. Furthermore, the TE PF is found to increase by up to 13.1 % for AMR Co-Ni alloy nanowires and by up to 52 % for GMR Co-Ni/Cu samples in an external applied magnetic field. The magnetic nanowires exhibit TE PFs that are of the same order of magnitude as TE PFs of Bi-Sb-Se-Te based thermoelectric materials and, additionally, give the opportunity to adjust the TE power output to changing loads and hotspots through external magnetic fields.
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Submitted 2 January, 2017;
originally announced January 2017.
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Magnetothermopower and magnetoresistance of single Co-Ni/Cu multilayered nanowires
Authors:
Tim Böhnert,
Anna Corinna Niemann,
Ann-Kathrin Michel,
Svenja Bäßler,
Johannes Gooth,
Bence G. Tóth,
Katalin Neuróhr,
László Péter,
Imre Bakonyi,
Victor Vega,
Victor M. Prida,
Kornelius Nielsch
Abstract:
The magnetothermopower and the magnetoresistance of single Co Ni/Cu multilayered nan-owires with various thicknesses of the Cu spacer are investigated. Both kinds of measurement have been performed as a function of temperature (50 K to 325 K) and under applied magnetic fields perpendicular to the nanowire axis, with magnitudes up to 15 % at room temperature. A linear relation between thermopower S…
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The magnetothermopower and the magnetoresistance of single Co Ni/Cu multilayered nan-owires with various thicknesses of the Cu spacer are investigated. Both kinds of measurement have been performed as a function of temperature (50 K to 325 K) and under applied magnetic fields perpendicular to the nanowire axis, with magnitudes up to 15 % at room temperature. A linear relation between thermopower S and electrical conductivity σ of the nanowires is found, with the magnetic field as an implicit variable. Combining the linear behavior of the S vs. σ and the Mott formula, the energy derivative of the resistivity has been determined. In order to extract the true nanowire materials parameters from the measured thermopower, a simple model based on the Mott formula is employed to distinguish the individual thermopower contributions of the sample. By assuming that the non-diffusive thermopower contributions of the nanowire can be neglected, it was found that the magnetic field induced changes of thermopower and resistivity are equivalent. The emphasis in the present paper is on the comparison of the magnetoresistance and magnetothermopower results and it is found that the same correlation is valid between the two sets of data for all samples, irrespective of the relative importance of the giant magnetoresistance or anisotropic magnetoresistance contributions in the various individual nanowires.
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Submitted 21 December, 2016;
originally announced December 2016.
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Giant magnetoresistance in electrodeposited Co-Cu/Cu multilayers: origin of absence of oscillatory behaviour
Authors:
I. Bakonyi,
E. Simon,
B. G. Tóth,
L. Péter,
L. F. Kiss
Abstract:
A detailed study of the evolution of the magnetoresistance was performed on electrodeposited Co/Cu multilayers with Cu layer thicknesses ranging from 0.5 nm to 4.5 nm. For thin Cu layers (up to 1.5 nm), anisotropic magnetoresistance (AMR) was observed whereas multilayers with thicker Cu layers exhibited clear giant magnetoresistance (GMR) behaviour. The GMR magnitude increased up to about 3.5 to 4…
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A detailed study of the evolution of the magnetoresistance was performed on electrodeposited Co/Cu multilayers with Cu layer thicknesses ranging from 0.5 nm to 4.5 nm. For thin Cu layers (up to 1.5 nm), anisotropic magnetoresistance (AMR) was observed whereas multilayers with thicker Cu layers exhibited clear giant magnetoresistance (GMR) behaviour. The GMR magnitude increased up to about 3.5 to 4 nm Cu layer thickness and slightly decreased afterwards. According to magnetic measurements, all samples exhibited ferromagnetic (FM) behaviour. The relative remanence turned out to be about 0.75 for both AMR and GMR type multilayers. This clearly indicates the absence of an antiferromagnetic (AF) coupling between adjacent magnetic layers for Cu layers even above 1.5 nm where the GMR effect occurs. The AMR behaviour at low spacer thicknesses indicates the presence of strong FM coupling (due to, e.g., pin-holes in the spacer and/or areas of the Cu layer where the layer thickness is very small). With increasing spacer thickness, the pin-hole density reduces and/or the layer thickness uniformity improves which both lead to a weakening of the FM coupling. This improvement in multilayer structure quality results in a better separation of magnetic layers and the weaker coupling (or complete absence of interlayer coupling) enables a more random magnetization orientation of adjacent layers, all this leading to an increase of the GMR. Coercive field and zero-field resistivity measurements as well as the results of a structural study reported earlier on the same multilayers provide independent evidence for the microstructural features established here. The large GMR reported previously on such Co/Cu multilayers at Cu layer thicknesses around 1 nm can be attributed to the presence of a fairly large superparamagnetic (SPM) fraction rather than being due to a strong AF coupling.
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Submitted 8 November, 2016;
originally announced November 2016.
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Preparation, structure and giant magnetoresistance of electrodeposited Fe Co/Cu multilayers
Authors:
B. G. Tóth,
L. Péter,
L. Pogány,
Á. Révész,
I. Bakonyi
Abstract:
No systematic studies have been carried out on the giant magnetoresistance (GMR) of electrodeposited (ED) Fe-Co/Cu multilayers since the elaboration of a method for the optimization of the Cu layer deposition potential. In this paper, we present results on the electrochemical optimization of the Cu layer deposition potential which was found to depend on the relative iron concentration in the bath.…
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No systematic studies have been carried out on the giant magnetoresistance (GMR) of electrodeposited (ED) Fe-Co/Cu multilayers since the elaboration of a method for the optimization of the Cu layer deposition potential. In this paper, we present results on the electrochemical optimization of the Cu layer deposition potential which was found to depend on the relative iron concentration in the bath. An X-ray diffraction study of ED Fe5Co95(1.5 nm)/Cu(dCu) multilayers with dCu ranging from 0.8 nm to 10 nm revealed an fcc structure. For most of the multilayers, a weak superlattice satellite reflection could be identified. The room-temperature magnetoresistance was studied in detail as a function of the individual layer thicknesses. Multilayers with Cu layer thicknesses above about 1.5 nm were found to exhibit a GMR behavior with a maximum GMR of about 5 % and a typical saturation field of 1 kOe. The GMR magnitude decreased with increasing Fe-content in the magnetic layer. The spacer layer thickness evolution of the MR data was established in detail after separating the ferromagnetic and superparamagnetic GMR contributions and no oscillatory GMR was found. A comparison with literature data on both physically deposited and ED Fe-Co/Cu multilayers is also made.
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Submitted 18 October, 2016;
originally announced October 2016.
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Magnetoresistance and surface roughness study of electrodeposited Ni50Co50/Cu multilayers
Authors:
B. G. Tóth,
L. Péter,
J. Dégi,
I. Bakonyi
Abstract:
Room-temperature transport properties (the zero-field resistivity, ρ0, and the GMR) were studied for ED Ni50Co50/Cu multilayers as a function of the individual layer thicknesses and total multilayer thickness. The Cu deposition potential was optimized in order to obtain the preset layer thicknesses. The surface roughness development was studied by AFM, which revealed an exponential roughening with…
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Room-temperature transport properties (the zero-field resistivity, ρ0, and the GMR) were studied for ED Ni50Co50/Cu multilayers as a function of the individual layer thicknesses and total multilayer thickness. The Cu deposition potential was optimized in order to obtain the preset layer thicknesses. The surface roughness development was studied by AFM, which revealed an exponential roughening with total thickness. The Cu layer thickness strongly influenced the roughness evolution. As expected, ρ0 decreased with increasing Cu layer thickness whereas it increased strongly for large total multilayer thicknesses that could be ascribed to the observed deposit roughening. All multilayers with Cu layer thicknesses above about 1.5 nm exhibited a GMR behavior with a maximum GMR of about 5 %. The GMR decreased for total multilayer thicknesses above about 300 nm due to the strong increase of ρ0, the latter caused by the enhanced roughness. The GMR data indicated the appearance of a current at angle to plane type scattering due to the layer undulations. The thickness evolution of the MR data was analyzed in detail after separating the ferromagnetic and superparamagnetic GMR contributions. It could be established that ED Ni-Co/Cu multilayers do not exhibit an oscillatory GMR behavior with spacer thickness.
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Submitted 20 September, 2016;
originally announced September 2016.
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Influence of Cu deposition potential on the giant magnetoresistance and surface roughness of electrodeposited Ni-Co/Cu multilayers
Authors:
B. G. Tóth,
L. Péter,
J. Dégi,
Á. Révész,
D. Oszetzky,
G. Molnár,
I. Bakonyi
Abstract:
It has been shown previously for electrodeposited Co/Cu multilayers that the single-bath electrodeposition process can be optimized from an electrochemical point of view in order to avoid unwanted Co dissolution and incorporation of Co in the non-magnetic layer during the Cu deposition pulse. In the present work, electrodeposition of Ni-Co/Cu multilayers has been studied to clarify if the same opt…
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It has been shown previously for electrodeposited Co/Cu multilayers that the single-bath electrodeposition process can be optimized from an electrochemical point of view in order to avoid unwanted Co dissolution and incorporation of Co in the non-magnetic layer during the Cu deposition pulse. In the present work, electrodeposition of Ni-Co/Cu multilayers has been studied to clarify if the same optimization method is appropriate when two magnetic elements are present and if this potential results in the largest giant magnetoresistance (GMR) for the particular alloy system studied. For this purpose, several Ni-Co/Cu multilayers were prepared by varying the deposition potential of the Cu layer. The composition analysis of the deposits showed that the Ni:Co ratio exhibits a minimum as a function of the Cu deposition potential, which can be explained by considering both the dissolution of Co and the mass transport of the reactants. Both the saturation GMR value and the intensity of the satellite peaks in the X-ray diffractograms were highly correlated with the resulting surface roughness of the deposits which was strongly varying with the Cu deposition potential. Higher GMR values, lower saturation fields and more perfect multilayer structure were observed for sufficiently positive Cu deposition potentials only which enabled a partial Co dissolution resulting in a reduced surface roughness. The results draw attention to the complexity of the optimization procedure of the deposition of multilayers with several alloying components.
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Submitted 2 September, 2016;
originally announced September 2016.
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Magnetoresistance and surface roughness study of the initial growth of electrodeposited Co/Cu multilayers
Authors:
B. G. Tóth,
L. Péter,
I. Bakonyi
Abstract:
The giant magnetoresistance (GMR) effect has been widely investigated on electrodeposited ferromagnetic/non-magnetic (FM/NM) multilayers generally containing a large number of bilayers. In most applications of the GMR effect, layered structures consisting of a relatively small number of consecutive FM and NM layers are used. It is of great interest, therefore, to investigate the initial stages of…
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The giant magnetoresistance (GMR) effect has been widely investigated on electrodeposited ferromagnetic/non-magnetic (FM/NM) multilayers generally containing a large number of bilayers. In most applications of the GMR effect, layered structures consisting of a relatively small number of consecutive FM and NM layers are used. It is of great interest, therefore, to investigate the initial stages of GMR multilayer film growth by electrodeposition. In the present work we have extended our previous studies on ED GMR multilayers to layered structures with a total thickness ranging from a few nanometers up to 70 nm. The evolution of the surface roughness and electrical transport properties of such ultrathin ED Co/Cu layered structures was investigated. Various layer combinations were produced including both Co and Cu either as starting or top layers in order (i) to see differences in the nucleation of the first layer and (ii) to trace out the effect of the so called exchange reaction. Special attention was paid to measure the field dependence of the magnetoresistance, MR(H) in order to derive information for the appearance of superparamagnetic regions in the magnetic layers. This proved to be helpful for monitoring the evolution of the layer microstructure at each step of the deposition sequence.
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Submitted 14 August, 2016;
originally announced August 2016.
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Temperature dependence of the electrical resistivity and the anisotropic magnetoresistance (AMR) of electrodeposited Ni Co alloys
Authors:
B. G. Tóth,
L. Péter,
Á. Révész,
J. Pádár,
I. Bakonyi
Abstract:
The electrical resistivity and the anisotropic magnetoresistance (AMR) was investigated for Ni Co alloys at and below room temperature. The Ni Co alloy layers having a thickness of about 2 um were prepared by electrodeposition on Si wafers with evaporated Cr and Cu underlayers. The alloy composition was varied in the whole concentration range by varying the ratio of Ni sulfate and Co sulfate in th…
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The electrical resistivity and the anisotropic magnetoresistance (AMR) was investigated for Ni Co alloys at and below room temperature. The Ni Co alloy layers having a thickness of about 2 um were prepared by electrodeposition on Si wafers with evaporated Cr and Cu underlayers. The alloy composition was varied in the whole concentration range by varying the ratio of Ni sulfate and Co sulfate in the electrolyte. The Ni Co alloy deposits were investigated first in the as deposited state on the substrates and then, by mechanically strip** them from the substrates, as self supporting layers both without and after annealing. According to an X ray diffraction study, a strongly textured face centered cubic (fcc) structure was formed in the as deposited state with an average grain size of about 10 nm. Upon annealing, the crystal structure was retained whereas the grain size increased by a factor of 3 to 5, depending on alloy composition. The zero field resistivity decreased strongly by annealing due to the increased grain size. The annealing hardly changed the AMR below 50 at.% Co but strongly decreased it above this concentration. The composition dependence of the resistivity and the AMR of the annealed Ni Co alloy deposits was in good quantitative agreement with the available literature data both at 13 K and at room temperature. Both transport parameters were found to exhibit a pronounced maximum in the composition range between 20 and 30 at.% Co and the data of the Ni Co alloys fit well to the limiting values of the pure component metals (fcc Ni and fcc Co). The only theoretical calculation reported formerly on fcc Ni Co alloys yielded at T=0K a resistivity value smaller by a factor of 5 and an AMR value larger by a factor of about 2 than the corresponding low temperature experimental data, although the theoretical results properly reproduced the composition dependence of both quantities.
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Submitted 7 July, 2016;
originally announced July 2016.
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Modeling the magnetoresistance vs. field curves of GMR multilayers with antiferromagnetic and/or orthogonal coupling by assuming single-domain state and coherent rotation
Authors:
Krisztián Szász,
Imre Bakonyi
Abstract:
In order to better understand the role of possible couplings in determining the giant magnetoresistance (GMR) behavior of multilayers, a knowledge of the dependence of the $GMR$ on magnetic field $H$ appears to be useful. Since a few specific cases have only been treated theoretically in the literature, it was decided to carry out a modeling of the $GMR(H)$ curves of ferromagnetic/non-magnetic (FM…
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In order to better understand the role of possible couplings in determining the giant magnetoresistance (GMR) behavior of multilayers, a knowledge of the dependence of the $GMR$ on magnetic field $H$ appears to be useful. Since a few specific cases have only been treated theoretically in the literature, it was decided to carry out a modeling of the $GMR(H)$ curves of ferromagnetic/non-magnetic (FM/NM) multilayers with various interlayer couplings. For simplicity, we focused on a trilayer structure (FM1/NM/FM2) corresponding fairly well to the case of a large number of FM/NM bilayers. To carry out the calculations, some fundamental assumptions were made: (i) single domain FM layer, in plane magnetization; (ii) the magnetization of each layer is the same; (iii) the magnetization vectors rotate in the plane of the layers in an external magnetic field. In order to calculate the $GMR(H)$ function, we need to know the magnetization process in the trilayer, i.e., the $M(H)$ function. Therefore, first we calculate the equilibrium angle $φ(H)$ between the two magnetization vectors as a function of the field by minimizing the total energy of the trilayer. According to most previous theoretical and experimental works, the angular dependence of the GMR is fairly well described by the relation $GMR(φ)\propto (1-\cosφ)$ and we used this relation to derive the $GMR(H)$ function. Along this line, the $M(H)$ and $GMR(H)$ curves were calculated for the following cases: (i) pure AF coupling; (ii) pure orthogonal coupling; (iii) AF coupling and orthogonal coupling simultaneously present. As to the calculation of the $GMR(H)$ curves, some of these configurations have not yet been treated formerly or for some specific parameter values only. For those cases for which calculations were reported in the literature for $M(H)$ and $GMR(H)$, our results agree with previous reports.
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Submitted 27 November, 2015;
originally announced November 2015.
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Near-substrate composition depth profile of direct current-plated and pulse-plated Fe-Ni alloys
Authors:
Katalin Neuróhr,
Attila Csik,
Kálmán Vad,
György Molnár,
Imre Bakonyi,
László Péter
Abstract:
Composition depth profiles of d.c.-plated and pulseplated Fe-Ni alloys have been investigated with the reverse depth profile analysis method. When d.c. plating is applied, the mole fraction of iron near the substrate is higher than during steadystate deposition since iron is preferentially deposited beside nickel and the achievement of the steadystate deposition condition takes time. The steadysta…
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Composition depth profiles of d.c.-plated and pulseplated Fe-Ni alloys have been investigated with the reverse depth profile analysis method. When d.c. plating is applied, the mole fraction of iron near the substrate is higher than during steadystate deposition since iron is preferentially deposited beside nickel and the achievement of the steadystate deposition condition takes time. The steadystate composition was achieved typically after depositing a 90-nm-thick alloy layer. In the pulseplating mode, samples with nearly uniform composition could be obtained at a duty cycle of 0.2 or smaller, and a continuous change in the composition profile could be seen as a function of the duty cycle above this value. A constant sample composition was achieved with pulseplating in a wide peak current density interval. The composition depth profile was also measured for a wide range of Fe2+ concentration. The different characteristics of the composition depth profile as a function of the deposition mode can be explained mostly in terms of mass transport effects. The elucidation of the results is fully in accord with the kinetic models of anomalous codeposition and with the assumption of the superposition of a stationary and a pulsating diffusion layer. The results achieved help to identify the conditions for the deposition of ultrathin magnetic samples with uniform composition along the growth direction.
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Submitted 17 February, 2014;
originally announced February 2014.
