Octave-spanning supercontinuum generation in a CMOS-compatible thin Si3N4 waveguide coated with highly nonlinear TeO2
Authors:
Hamidu M. Mbonde,
Neetesh Singh,
Bruno L. Segat Frare,
Milan Sinobad,
Pooya Torab Ahmadi,
Batoul Hashemi,
Dawson. B. Bonneville,
Peter Mascher,
Franz X. Kaertner,
Jonathan D. B. Bradley
Abstract:
Supercontinuum generation (SCG) is an important nonlinear optical process enabling broadband light sources for many applications, for which silicon nitride(Si3N4) has emerged as a leading on-chip platform.To achieve suitable group velocity dispersion and high confinement for broadband SCG the Si3N4 waveguide layer used is typically thick (>~700 nm), which can lead to high stress and cracks unless…
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Supercontinuum generation (SCG) is an important nonlinear optical process enabling broadband light sources for many applications, for which silicon nitride(Si3N4) has emerged as a leading on-chip platform.To achieve suitable group velocity dispersion and high confinement for broadband SCG the Si3N4 waveguide layer used is typically thick (>~700 nm), which can lead to high stress and cracks unless specialized processing steps are used. Here, we report on efficient octave spanning SCG in a thinner moderate-confinement 400-nm Si3N4 platform using a highly nonlinear tellurium oxide (TeO2) coating. An octave-spanning supercontinuum is achieved at a low peak power of 258 W using a 100-fs laser centered at 1565 nm. Our numerical simulations agree well with the experimental results showing an increase of waveguide's nonlinear parameter by a factor of 2.5 when coating the Si3N4 waveguide with TeO2 film. This work demonstrates highly efficient SCG via effective dispersion engineering and an enhanced nonlinearity in a CMOS-compatible hybrid TeO2-Si3N4 waveguides and a promising route to monolithically integrated nonlinear, linear, and active functionalities on a single silicon photonic chip.
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Submitted 15 September, 2023;
originally announced September 2023.
