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Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering
| H. B. Nie: | Is registered as an author of this paper. Not currently an endorser. (why?) |
S. Y. Xu, S. J. Wang, L. P. You, Z. Yang, C. K. Ong, J. Li and T. Y. F. Liew are not registered as owners of this paper. (why?)