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Impact of the Top SiO2 Interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure
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Xianzhou Shao, Mingkai Bai, Xinpei Jia, Saifei Dai, Xiaoqing Sun, Runhao Han, Jia Yang, Xiaoyu Ke, Fengbin Tian, Shuai Yang, Junshuai Chai, Hao Xu, Xiaolei Wang, Wenwu Wang and Tianchun Ye are not registered as owners of this paper. (why?)